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Articles 1 - 5 of 5
Full-Text Articles in Computational Engineering
Explorations Into Machine Learning Techniques For Precipitation Nowcasting, Aditya Nagarajan
Explorations Into Machine Learning Techniques For Precipitation Nowcasting, Aditya Nagarajan
Masters Theses
Recent advances in cloud-based big-data technologies now makes data driven solutions feasible for increasing numbers of scientific computing applications. One such data driven solution approach is machine learning where patterns in large data sets are brought to the surface by finding complex mathematical relationships within the data. Nowcasting or short-term prediction of rainfall in a given region is an important problem in meteorology. In this thesis we explore the nowcasting problem through a data driven approach by formulating it as a machine learning problem.
State-of-the-art nowcasting systems today are based on numerical models which describe the physical processes leading to ...
Magneto-Electric Approximate Computational Framework For Bayesian Inference, Sourabh Kulkarni
Magneto-Electric Approximate Computational Framework For Bayesian Inference, Sourabh Kulkarni
Masters Theses
Probabilistic graphical models like Bayesian Networks (BNs) are powerful artificial-intelligence formalisms, with similarities to cognition and higher order reasoning in the human brain. These models have been, to great success, applied to several challenging real-world applications. Use of these formalisms to a greater set of applications is impeded by the limitations of the currently used software-based implementations. New emerging-technology based circuit paradigms which leverage physical equivalence, i.e., operating directly on probabilities vs. introducing layers of abstraction, promise orders of magnitude increase in performance and efficiency of BN implementations, enabling networks with millions of random variables. While majority of applications ...
Skynet: Memristor-Based 3d Ic For Artificial Neural Networks, Sachin Bhat
Skynet: Memristor-Based 3d Ic For Artificial Neural Networks, Sachin Bhat
Masters Theses
Hardware implementations of artificial neural networks (ANNs) have become feasible due to the advent of persistent 2-terminal devices such as memristor, phase change memory, MTJs, etc. Hybrid memristor crossbar/CMOS systems have been studied extensively and demonstrated experimentally. In these circuits, memristors located at each cross point in a crossbar are, however, stacked on top of CMOS circuits using back end of line processing (BOEL), limiting scaling. Each neuron’s functionality is spread across layers of CMOS and memristor crossbar and thus cannot support the required connectivity to implement large-scale multi-layered ANNs.
This work proposes a new fine-grained 3D integrated ...
The Impact Of Quantum Size Effects On Thermoelectric Performance In Semiconductor Nanostructures, Adithya Kommini
The Impact Of Quantum Size Effects On Thermoelectric Performance In Semiconductor Nanostructures, Adithya Kommini
Masters Theses
An increasing need for effective thermal sensors, together with dwindling energy resources, have created renewed interests in thermoelectric (TE), or solid-state, energy conversion and refrigeration using semiconductor-based nanostructures. Effective control of electron and phonon transport due to confinement, interface, and quantum effects has made nanostructures a good way to achieve more efficient thermoelectric energy conversion. This thesis studies the two well-known approaches: confinement and energy filtering, and implements improvements to achieve higher thermoelectric performance. The effect of confinement is evaluated using a 2D material with a gate and utilizing the features in the density of states. In addition to that ...
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Masters Theses 1911 - February 2014
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system and improve the quality of the printed pattern. The fidelity of the pattern is degraded due to the disparity between the wavelength of light used in optical lithography, and the required size of printed features. In order to improve the aerial image, the mask is modified. This process is called OPC, OPC is an iterative process where a mask shape is modified to decrease the disparity between the required and printed ...